PRODUCTS
Wet Bench
- Description
-
Applications: RCA cleaning, PR wet strip, Dielectric layer wet etch, Metal layer wet etch，furnace pre-cleaning et al.
Tool type: cassette type & cassette-less type.
Wafer size: 100 mm~300 mm
Features & configurations:
Supporting C.C.S.S and L.C.S.S.
Marangoni dry or spin dry
Auto dosing, bleed&feed
Heating control, concentration control,flow rate control, pressure control et al.
Bath overheating protection, leak sensors configuration
Chemistry reclaim
SECS/GEM communication
Process Specification:
non-uniformity : WiW ≤4; WtW≤4%；RtR≤4%
Particle adders: PA<30ea@0.09um （SiO2 wafer with incoming particle count <50ea）
Metal contamination: <5E9 atoms/cm2
Category:
Products
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Contact us
Address: No. 889 Zhonghua Road, Bacheng Town, Kunshan City,
Jiangsu Province, China
Customer service hotline：
0512-57762325 0512-55239392
Fax：0512-55239392
Website：www.kszcauto.cn
E-mail：zcauto@yeah.net
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