Single Wafer Cleaner
Applications: RCA cleaning, pre-deposition cleaning, post-etch cleaning, post-CMP cleaning,wet etch, pre-EPI cleaning et al.
Wafer size: 100 mm ~ 300 mm
Features & configurations:
4~16 chambers, supporting customization
Supporting chemistry C.C.S.S. and L.C.S.S.
Heating control, concentration control, flow rate control, pressure control et al.
Separated exhaust for acid, base and organics
High-definition camera, E-flow (option)
Etch non-uniformity: WiW≤3%；WtW≤3%；RtR≤3%
Particle adders: PA<firstname.lastname@example.org （SiO2 wafer with incoming particle count <50ea）
Metal contamination: <5E9 atoms/cm2