Wafer Single Wafer Cleaner
The single-wafer cleaning machine has a better cleaning effect than the tank cleaning machine, and is more suitable for new semiconductor manufacturing processes.
2/4/6/8/12/16 chambers can be customized according to customer needs, and the maximum processing speed of a single chamber can reach 35 pieces/hour.
It can be customized according to customer needs and is suitable for cleaning 8-inch/12-inch silicon wafers. It integrates a sophisticated chemical liquid proportioning device and a waste liquid recovery device (optional).
Application: Designed for advanced cleaning and etching, suitable for pre- and post-process cleaning.
Fully support SECS/GEM communication protocol