ZHICHENG

APPLICATION

Integrated Circuit Manufacturing

Integrated Circuit (IC) is the process of interconnecting the most basic components and wiring required in a circuit, such as transistors, resistors, capacitors, and inductors, through various physical and chemical methods and industrial means such as thin film/thick film growth, precision pattern transfer, vacuum, and high-energy particles, onto a small or several small semiconductor chips or dielectric substrates, and integrating them into a single tube shell through a series of packaging processes, Become a micro structure that can achieve the required functions of the design.

With the increase in the number of transistors, the decrease in line width, the increase in layers, and the complexity of processes in integrated circuits, various types of pollution such as particles, metal ions, organic compounds, and natural oxide layers pose great challenges to the manufacturing of integrated circuits. These substances are prone to damage, failure, and affect the formation of geometric features in integrated circuits.

The role of wet cleaning is to effectively use various chemicals and physical means such as ultrasound to clean the aforementioned particles, metal ions, natural oxide layers, and organic matter without damaging the surface and electrical characteristics of integrated circuits, in order to ensure the industrial and repeatable reproduction of expected circuit functions.

The ZCWB series single chip cleaning machine of Zhicheng Semiconductor can address one or more of the above-mentioned pollutants, using one or more chemicals or chemical combinations - from a single sulfuric acid, hydrofluoric acid, etc. to a complete RCA cleaning process of SPM/DHF/SC1/SC2- and can meet the various production capacity needs of clients by flexibly matching the cavity.

The ZCAB series slot cleaning machine can meet customers' needs for stable equipment operation, high production capacity, and fast processing speed in the traditional mature integrated circuit field.